GaAs on InP MESFETs and circuits for OEICs

A. Clei, S. Sainson, M. Feuillade, K. Sauv, R. Azoulay, J. Dumas, M. Chertouk, O. Calliger, R. Lefevre
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引用次数: 3

Abstract

High performance FETs and circuits realized on GaAs layers heteroepitaxially grown on InP are described. Low parasitic effects are ascertained by noise and pulse measurements indicating a low electrical activity of the defects related to the lattice mismatch. 0.3 /spl mu/m gatelength laser drivers show satisfactory behavior at 10 Gbit/s. Device degradation observed after accelerated aging tests results from contact degradation rather than from mismatched materials problems. GaAs on InP FETs appear to be good candidates for 1.3-1.55 /spl mu/m OEICs.<>
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InP mesfet上的GaAs和oeic电路
描述了在InP上异质外延生长的GaAs层上实现的高性能场效应管和电路。通过噪声和脉冲测量确定了低寄生效应,表明与晶格失配相关的缺陷的低电活动。0.3 /spl mu/m栅极长度激光驱动器在10gbit /s速率下表现出满意的性能。加速老化试验后观察到的器件退化是由于接触退化,而不是由于材料不匹配问题。InP fet上的GaAs似乎是1.3-1.55 /spl mu/m oeic的良好候选者
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