Monte Carlo study of effective mobility in short channel FDSOI MOSFETs

Sebastien Guarnay, F. Triozon, S. Martinie, Y. Niquet, A. Bournel
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Abstract

Quasi-ballistic electron transport in ultrashort FDSOI devices is analyzed using Multi-Subband Monte Carlo (MSMC) simulations, taking into account the main scattering mechanisms: phonons, surface roughness, and charged impurities in the access regions. In particular, the ballistic resistance (defined as the resistance of the channel in absence of scattering) was extracted from ballistic simulations, and shown to be in good agreement with an accurate analytical model including the contact resistance effect. The simulations show an apparent mobility degradation when the channel length decreases, comparable to that observed in experiments, without requiring any additional scattering mechanism in order to explain it.
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短沟道FDSOI mosfet有效迁移率的蒙特卡罗研究
利用多子带蒙特卡罗(MSMC)模拟分析了超短FDSOI器件中的准弹道电子输运,考虑了主要的散射机制:声子、表面粗糙度和通道区域的带电杂质。特别地,从弹道模拟中提取了弹道阻力(定义为无散射时通道的阻力),并与包含接触阻力效应的精确解析模型相吻合。模拟表明,当通道长度减小时,迁移率明显下降,与实验中观察到的结果相当,而不需要任何额外的散射机制来解释它。
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