Modeling of deep-submicrometer MOSFETs: random impurity effects, threshold voltage shifts and gate capacitance attenuation

D. Vasileska, W. J. Gross, D. Ferry
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引用次数: 40

Abstract

The authors present simulation results for the subthreshold characteristics of n-channel MOSFETs with 0.1 /spl mu/m gate-length and 0.05 /spl mu/m gate-width obtained with our 3D-DD simulator. We also presented a new method that one can successfully use in a particle-based simulator to properly account for the short-range portions of the e-e and e-i interactions without double-counting the long-range portions of these two interaction terms.
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深亚微米mosfet的建模:随机杂质效应、阈值电压偏移和栅极电容衰减
本文给出了用3D-DD模拟器对栅极长度为0.1 /spl μ m、栅极宽度为0.05 /spl μ m的n沟道mosfet的亚阈值特性进行仿真的结果。我们还提出了一种新的方法,人们可以在基于粒子的模拟器中成功地使用它来正确地解释e-e和e-i相互作用的短程部分,而不重复计算这两个相互作用项的远程部分。
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