The Statistical Failure Analysis for the Design of Robust SRAM in Nano-Scale Era

Young-Gu Kim, Soo-Hwan Kim, H. Lim, Sanghoon Lee, Keun-Ho Lee, Young-Kwan Park, Moon-Hyun Yoo
{"title":"The Statistical Failure Analysis for the Design of Robust SRAM in Nano-Scale Era","authors":"Young-Gu Kim, Soo-Hwan Kim, H. Lim, Sanghoon Lee, Keun-Ho Lee, Young-Kwan Park, Moon-Hyun Yoo","doi":"10.1109/ISQED.2008.108","DOIUrl":null,"url":null,"abstract":"Increase of the process variability with aggressive technology scaling causes many productivity issues in VLSI manufacturing. Analysis about the relationship between process variability and failure has been performed to specify guidelines in both technology and design aspects for yield optimization. By applying the proposed methodology, the core scheme and the operating voltage of the 200 MHz SRAM were determined to secure the immunity to operational failures. In DFM point of view, the statistical circuit analysis for failure characteristics is indispensable to guarantee an optimal yield in manufacturing.","PeriodicalId":243121,"journal":{"name":"9th International Symposium on Quality Electronic Design (isqed 2008)","volume":"59 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"9th International Symposium on Quality Electronic Design (isqed 2008)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2008.108","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Increase of the process variability with aggressive technology scaling causes many productivity issues in VLSI manufacturing. Analysis about the relationship between process variability and failure has been performed to specify guidelines in both technology and design aspects for yield optimization. By applying the proposed methodology, the core scheme and the operating voltage of the 200 MHz SRAM were determined to secure the immunity to operational failures. In DFM point of view, the statistical circuit analysis for failure characteristics is indispensable to guarantee an optimal yield in manufacturing.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
纳米时代稳健SRAM设计的统计失效分析
在大规模集成电路制造中,工艺变异性的增加与积极的技术缩放导致了许多生产力问题。对工艺变异性和失效之间的关系进行了分析,以便在技术和设计方面为良率优化指定指导方针。通过应用所提出的方法,确定了200 MHz SRAM的核心方案和工作电压,以确保对操作故障的抗扰性。从DFM的角度来看,对失效特性进行统计电路分析是保证制造过程中良率最优的必要条件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
A Low Energy Two-Step Successive Approximation Algorithm for ADC Design Robust Analog Design for Automotive Applications by Design Centering with Safe Operating Areas Characterization of Standard Cells for Intra-Cell Mismatch Variations Noise Interaction Between Power Distribution Grids and Substrate Error-Tolerant SRAM Design for Ultra-Low Power Standby Operation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1