The Electrical Performances of Monolayer MoS2-Based Transistors Under Ultra-Low Temperature

Su Mengxing, Xie Dan, Sun Yilin, L. Weiwei, Ren Tianling
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Abstract

The Schottky barrier between 2D materials and metal always play an important role in the determination of the electrical and optical properties of the transistors. In this work, the Schottky barrier between Monolayer MoS2 and Cr has been carefully investigated under different temperature. The Schottky barrier height of MoS2 and Cr is calculated to be 0.189 eV under room temperature. As the temperature decreases, the contact resistance between MoS2 and Cr increases according to the output curves. The change mechanism is further analyzed using the photoluminescence spectrum under different temperatures. This work investigates the electronic and optical characteristics of MoS2-based FET under low temperature and provides guidance for better designing the layered transition-metal-dichalcogenides based devices.
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超低温下单层mos2基晶体管的电学性能
二维材料与金属之间的肖特基势垒在决定晶体管的电学和光学特性方面一直起着重要的作用。本文研究了不同温度下单层MoS2和Cr之间的肖特基势垒。计算出室温下MoS2和Cr的肖特基势垒高度为0.189 eV。根据输出曲线,随着温度的降低,MoS2和Cr之间的接触电阻增大。利用不同温度下的光致发光光谱进一步分析了其变化机理。本文研究了mos2基场效应管在低温下的电子和光学特性,为更好地设计层状过渡金属-二硫化物基器件提供了指导。
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