{"title":"Internal chip ESD phenomena beyond the protection circuit","authors":"C. Duvvury, R. Rountree, O. Adams","doi":"10.1109/RELPHY.1988.23419","DOIUrl":null,"url":null,"abstract":"V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<<ETX>>","PeriodicalId":102187,"journal":{"name":"26th Annual Proceedings Reliability Physics Symposium 1988","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"88","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"26th Annual Proceedings Reliability Physics Symposium 1988","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1988.23419","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 88
Abstract
V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<>