Synthesis and characterization of nickel cobalt oxide thin films

G. Calin, M. Irimia, C. Scarlat, M. Purica, F. Comanescu, F. Iacomi
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引用次数: 4

Abstract

p-Type transparent and conductive cobalt-nickel oxide films of 130 nm thickness, have been deposited by spin coating method on glass substrates. The electrical and optical properties of the oxides have been studied as a function of the x=Co/(Co+Ni) ratio. A combination of x-ray diffraction, x-ray photoelectron spectroscopy and Raman spectroscopy was used in order to investigate thin film structures. Thin films of mixed oxides: NiCo2O4, Ni1.71 Co1.29 O4; NiO were obtained for x>0.60. The electrical conductivity of these films reaches a maximum conductivity at this stoichiometry.
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镍钴氧化物薄膜的合成与表征
采用自旋镀膜方法在玻璃衬底上制备了厚度为130 nm的p型透明导电钴镍氧化物薄膜。研究了氧化物的电学和光学性质与x=Co/(Co+Ni)比值的关系。结合x射线衍射、x射线光电子能谱和拉曼能谱对薄膜结构进行了研究。混合氧化物薄膜:NiCo2O4, Ni1.71 Co1.29 O4;当x>0.60时获得NiO。这些薄膜的电导率在这个化学计量中达到最大电导率。
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