Synthesis and Characterization of Tungsten Oxide Electrochromic Thin Films

Yingpeng Zhen, T. Gaol, B. P. Jelle
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引用次数: 1

Abstract

A radio frequency sputtering method was utilized and developed for tungsten oxide film preparation. The thickness of tungsten oxide film can be controlled at nano scale. Tungsten oxide thin films with thickness of ~36 nm was prepared and investigated. The morphologies and microstructures of the as-prepared tungsten oxide thin films were characterized using X-ray diffraction, scanning electron microscopy, and Flourier transform infrared spectroscopy. Tungsten oxide films utilized in the laboratory changed color from colorless to blue during electrochemical cycles, showing a potential for assembling electrochromic smart windows to modulate the transmitted solar radiations.
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氧化钨电致变色薄膜的合成与表征
采用射频溅射法制备氧化钨薄膜。氧化钨薄膜的厚度可以在纳米尺度上进行控制。制备并研究了厚度为~36 nm的氧化钨薄膜。利用x射线衍射、扫描电镜和红外光谱对制备的氧化钨薄膜的形貌和微观结构进行了表征。在实验室中使用的氧化钨薄膜在电化学循环中从无色变为蓝色,显示出组装电致变色智能窗口来调制透射的太阳辐射的潜力。
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