T2: Statistical Methods for VLSI Test and Burn-in Optimization

A. Singh
{"title":"T2: Statistical Methods for VLSI Test and Burn-in Optimization","authors":"A. Singh","doi":"10.1109/ATS.2005.104","DOIUrl":null,"url":null,"abstract":"VLSI circuits have been traditionally tested individually following manufacture; the same tests being applied to all ICs. However, as manufacturing test costs continue to show a disproportionate increase in relation to IC fabrication costs, innovative new statistical methods are being introduced to optimize testing. Such methods fall into two broad categories: those that exploit statistical information in regard to the variation of process parameters on wafers, and those that exploit the statistics of defect distributions on wafers. This tutorial presents test methodologies that span both these categories and illustrate their effectiveness with experimental results from a number of recent studies on production circuits from LSI Logic, IBM, Intel and TI","PeriodicalId":373563,"journal":{"name":"14th Asian Test Symposium (ATS'05)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"14th Asian Test Symposium (ATS'05)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ATS.2005.104","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

VLSI circuits have been traditionally tested individually following manufacture; the same tests being applied to all ICs. However, as manufacturing test costs continue to show a disproportionate increase in relation to IC fabrication costs, innovative new statistical methods are being introduced to optimize testing. Such methods fall into two broad categories: those that exploit statistical information in regard to the variation of process parameters on wafers, and those that exploit the statistics of defect distributions on wafers. This tutorial presents test methodologies that span both these categories and illustrate their effectiveness with experimental results from a number of recent studies on production circuits from LSI Logic, IBM, Intel and TI
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
T2: VLSI测试和老化优化的统计方法
VLSI电路传统上在制造后单独测试;对所有ic应用相同的测试。然而,随着制造测试成本继续显示出与IC制造成本不成比例的增长,正在引入创新的新统计方法来优化测试。这些方法可分为两大类:一类是利用晶圆上工艺参数变化的统计信息,另一类是利用晶圆上缺陷分布的统计信息。本教程介绍了跨越这两个类别的测试方法,并通过LSI Logic, IBM, Intel和TI最近在生产电路上的一些研究的实验结果说明了它们的有效性
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Efficient Static Compaction Techniques for Sequential Circuits Based on Reverse Order Restoration and Test Relaxation Practical Aspects of Delay Testing for Nanometer Chips State-reuse Test Generation for Progressive Random Access Scan: Solution to Test Power, Application Time and Data Size A Framework for Automatic Assembly Program Generator (A^2PG) for Verification and Testing of Processor Cores Arithmetic Test Strategy for FFT Processor
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1