Analysis of I-V measurements on Pt/Au-GaN Schottky contacts in a wide temperature range

D. Donoval, V. Kulikov, P. Beno, J. Racko
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Abstract

The formerly derived modified method of evaluation of the Schottky barrier height applied on Pt/Au-GaN Schottky structures is presented. It is based on the measurement of I-V characteristics in a wide temperature range. By subtraction of generation-recombination, tunnelling and leakage currents from the total current, the "pure" thermionic emission current I/sub te/ and subsequently Schottky barrier height /spl phi//sub b/ can be evaluated with higher physical relevance. The advantage of the mentioned method is that it allows evaluation of /spl phi//sub b/ from the measured I-V characteristics which significantly deviate from the ideal thermionic-emission characteristics represented in semi-logarithmic coordinates by a straight line. The determination of the Schottky barrier ob on GaN and related compound semiconductors with higher precision is important for further analysis of new combinations of metals and semiconductors and better understanding of the physical behaviour at the interface.
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宽温度范围内Pt/Au-GaN肖特基触点I-V测量分析
提出了先前导出的用于Pt/Au-GaN肖特基结构的肖特基势垒高度评价的改进方法。它基于在宽温度范围内测量I-V特性。通过从总电流中减去产生复合、隧穿和泄漏电流,“纯”热离子发射电流I/sub - te/和随后的肖特基势垒高度/spl phi//sub - b/可以获得更高的物理相关性。上述方法的优点是,它允许从测量的I-V特性中评估/spl phi//sub b/,这些特性明显偏离半对数坐标中用直线表示的理想热离子发射特性。高精度测定氮化镓和相关化合物半导体上的肖特基势垒对进一步分析金属和半导体的新组合以及更好地理解界面处的物理行为具有重要意义。
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