Electro-Optical Analysis and Numerical Modeling of Cu2O as the Absorber Layer in Advanced Solar Cells

C. Dumitru, L. Fara, Ørnulf Nordseth, I. Chilibon, Raj Kumar, B. Svensson, Florin Drăgan, Vlad Muscurel, D. Craciunescu, P. Sterian
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引用次数: 2

Abstract

Solar cells in tandem with metal-oxide heterojunctions are interesting from a development standpoint for the next step beyond silicon performance limitations in high-efficiency solar cells. High optical absorptance makes copper oxide a prospective absorber layer. This work is constituted as an overview on the original work of the authors, based on experimental analysis of the copper oxide absorber layer and numerical modeling of its electro-optical characteristics. Copper oxide films were synthesized by RF/DC magnetron sputtering on quartz substrates. The electro-optical and structural characteristics of the layer incorporating metal oxides have been investigated using SEM (Scanning Electron Microscopy), SFM (Scanning Force Microscopy), Hall effect measurements, Fourier-transform infrared spectroscopy (FTIR) and spectrofluorometry. The SEM analysis shows an increase of the grain size in the sample treated with rapid thermal annealing at 900 °C. SFM analysis shows that thermal annealing increases the surface roughness by a factor of 10. FTIR spectra show cupric oxide peaks from oxidation of the copper oxide at the quartz. A Silvaco Atlas model was implemented in order to study the electrical parameters of a metal-oxide heterojunction with Cu2O and AZO, mainly studying the effect of a buffer layer in the heterojunction structure, as well as varying the layer thickness, the doping level and the defect density for several materials in the structure. The OPAL 2 simulation platform was deployed to model the optical parameters of the heterojunction structure, including the reflectance, transmittance and absorptance.
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Cu2O作为先进太阳能电池吸收层的电光分析与数值模拟
从发展的角度来看,与金属氧化物异质结串联的太阳能电池很有趣,可以超越硅的性能限制,实现高效太阳能电池的下一步发展。高光吸收率使氧化铜成为一种有前途的吸收层。本文在对氧化铜吸收层进行实验分析并对其电光特性进行数值模拟的基础上,对前人的研究成果进行了综述。采用射频/直流磁控溅射技术在石英衬底上合成了氧化铜薄膜。利用扫描电子显微镜(SEM)、扫描力显微镜(SFM)、霍尔效应测量、傅里叶变换红外光谱(FTIR)和荧光光谱法研究了含金属氧化物层的电光和结构特征。SEM分析表明,经过900℃快速退火处理的样品晶粒尺寸增大。SFM分析表明,热退火使表面粗糙度提高了10倍。红外光谱显示了石英中氧化铜的氧化峰。为了研究含Cu2O和AZO的金属氧化物异质结的电学参数,采用了Silvaco Atlas模型,主要研究了缓冲层对异质结结构的影响,以及结构中几种材料的层厚、掺杂水平和缺陷密度的变化。利用OPAL 2仿真平台对异质结结构的反射率、透射率和吸收率等光学参数进行了模拟。
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