Closed-Form Modeling Approach of Trap-Assisted Tunneling Current for Use in Compact TFET Models

F. Horst, A. Farokhnejad, B. Iñíguez, A. Kloes
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引用次数: 4

Abstract

This paper presents a novel compact modeling approach to consider the effect of trap-assisted tunneling (TAT) in the calculations of the tunneling current in tunnel field-effect transistors (TFETs). The closed-form and physics-based model equations are implemented in the hardware description language Verilog-A and thus extend an existing model for the B2B tunneling current calculation in double-gate (DG) TFETs.In order to verify the modeling approach, simulation results are compared to TCAD Sentaurus simulations. The compact model shows a good fit in the current transfer curves for various drain-source voltages, trap densities, drain doping concentrations and different source materials. The current output curve and the output conductance stay also in good agreement with TCAD data. In the next step, the compact model is verified with the help of measurements of fabricated complementary TFET devices. During the verification process, limitations and advantages of the modeling approach are analyzed and discussed. The influence of TAT on a fabricated single-stage TFET inverter is investigated in a last verification step, whereby the numerical stability and flexibility of the model is demonstrated.
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用于紧凑ttfet模型的陷阱辅助隧道电流封闭建模方法
在计算隧道场效应晶体管(tfet)的隧道电流时,提出了一种考虑陷阱辅助隧道效应(TAT)影响的新颖紧凑的建模方法。封闭形式和基于物理的模型方程在硬件描述语言Verilog-A中实现,从而扩展了双栅(DG) tfet中B2B隧道电流计算的现有模型。为了验证建模方法,将仿真结果与TCAD Sentaurus仿真结果进行了比较。紧凑模型对各种漏极-源极电压、陷阱密度、漏极掺杂浓度和不同源极材料的电流转移曲线均有较好的拟合。电流输出曲线和输出电导也与TCAD数据保持良好的一致。在接下来的步骤中,利用已制作的互补型TFET器件的测量来验证紧凑模型。在验证过程中,分析和讨论了建模方法的局限性和优点。在最后的验证步骤中,研究了TAT对制造的单级TFET逆变器的影响,从而证明了模型的数值稳定性和灵活性。
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