Device Modeling of Graded III-N HEMTs for Improved Linearity

M. Ancona, J. Calame, D. Meyer, S. Rajan
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引用次数: 4

Abstract

When GaN HEMTs are used in power amplifier applications, their performance falls well short of ideal due to power-gain roll-off that results from having a peaked transconductance characteristic. A promising design solution involves compositionally grading the channel, and we here formulate a numerical device model to explore this approach that couples linear electroelasticity, diffusion-drift transport with new mobility models, and density-gradient theory. Lumped modeling of the large-signal behavior is also developed to explore the power amplifier performance. Preliminary results presented here indicate that the graded-channel idea has value, especially for gate lengths greater than about 100nm.
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改善线性度的分级III-N hemt器件建模
当GaN hemt用于功率放大器应用时,由于具有峰值跨导特性导致的功率增益滚降,其性能远远低于理想。一个很有前途的设计解决方案包括对通道进行成分分级,我们在这里制定了一个数值装置模型来探索这种将线性电弹性、扩散-漂移输运与新的迁移率模型和密度梯度理论相结合的方法。为了研究功率放大器的性能,还建立了大信号行为的集总建模。本文的初步结果表明,梯度通道的想法是有价值的,特别是对于栅极长度大于100nm的情况。
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