Engineering TID modeling for the SEE and performances evaluations of integrated CMOS circuits at cryogenic temperatures

L. Artola, S. Ducret, G. Hubert
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Abstract

This paper presents a total ionizing dose (TID) modeling approach based on experimental Cobalt60 irradiations of n-MOS and p-MOS transistors. The TID models were developed for the investigation of complementary metal oxide semiconductor (CMOS) gates performances used in a readout integrated circuit (ROIC) at cryogenic temperatures.
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低温下集成CMOS电路的工程TID建模和性能评估
本文提出了一种基于钴60辐照n-MOS和p-MOS晶体管的总电离剂量(TID)建模方法。建立了用于研究读出集成电路(ROIC)中互补金属氧化物半导体(CMOS)栅极在低温下的性能的TID模型。
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