Application of machine learning methods in post-silicon yield improvement

B. Yigit, Grace Li Zhang, Bing Li, Yiyu Shi, Ulf Schlichtmann
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引用次数: 4

Abstract

In nanometer scale manufacturing, process variations have a significant impact on circuit performance. To handle them, post-silicon clock tuning buffers can be included into the circuit to balance timing budgets of neighboring critical paths. The state of the art is a sampling-based approach, in which an integer linear programming (ILP) problem must be solved for every sample. The runtime complexity of this approach is the number of samples multiplied by the required time for an ILP solution. Existing work tries to reduce the number of samples but still leaves the problem of a long runtime unsolved. In this paper, we propose a machine learning approach to reduce the runtime by learning the positions and sizes of post-silicon tuning buffers. Experimental results demonstrate that we can predict buffer locations and sizes with a very good accuracy (90% and higher) and achieve a significant yield improvement (up to 18.8%) with a significant speed-up (up to almost 20 times) compared to existing work.
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机器学习方法在后硅良率提高中的应用
在纳米级制造中,工艺变化对电路性能有重大影响。为了处理这些问题,可以在电路中加入后硅时钟调谐缓冲器来平衡相邻关键路径的时序预算。目前的现状是一种基于抽样的方法,其中必须为每个样本解决整数线性规划(ILP)问题。这种方法的运行时复杂度是样本数量乘以ILP解决方案所需的时间。现有的工作试图减少样本的数量,但仍然没有解决长时间运行的问题。在本文中,我们提出了一种机器学习方法,通过学习后硅调谐缓冲区的位置和大小来减少运行时间。实验结果表明,与现有的工作相比,我们可以以非常好的精度(90%或更高)预测缓冲区的位置和大小,并实现显着的良率提高(高达18.8%)和显着的速度提高(高达近20倍)。
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