{"title":"Development and Characterization of Ti/TiN/Al Film Compensation Resistor with Low Resistance","authors":"Wei Zhang, Xiulan Cheng, Xiaodong Wang","doi":"10.1109/CICTA.2018.8706074","DOIUrl":null,"url":null,"abstract":"Low compensation Ti/TiN/Al film resistor including resistance and two pads was designed and fabricated with one step of lithography and metal sputter. The fabricated 8$\\mu$m width near 50$\\Omega$ resistor was stable and precise after annealing, which can be loaded with 8V DC voltage for over 60 minutes.","PeriodicalId":186840,"journal":{"name":"2018 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICTA.2018.8706074","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Low compensation Ti/TiN/Al film resistor including resistance and two pads was designed and fabricated with one step of lithography and metal sputter. The fabricated 8$\mu$m width near 50$\Omega$ resistor was stable and precise after annealing, which can be loaded with 8V DC voltage for over 60 minutes.
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