{"title":"Electrical stability of flexible a-IGZO TFT under strained condition","authors":"M. Hasan, M. Billah, Jin Jang","doi":"10.1109/AM-FPD.2016.7543660","DOIUrl":null,"url":null,"abstract":"We report the effect of tensile strain on the electrical performance of flexible a-In-Ga-Z-O (a-IGZO) thin-film transistor (TFT). Positive bias stress (PBS) measurement with Vgs = 20 V and Vds = 0 V in a-IGZO TFTs show positive transfer shift due to the trapping of negative charges, likely electron trapping. We observed that tensile strained TFT with 2 mm bending radius exhibits a positive ΔVTh (V) ~2.3 V shift compared to flat condition TFT (ΔVth (V) ~1.5 V) after 3.6K seconds stress. It clearly revels that more charges are trapped at the gate insulator/a-IGZO interface when the Fermi level is shifted downward by PBS with strained geometry.","PeriodicalId":422453,"journal":{"name":"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AM-FPD.2016.7543660","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We report the effect of tensile strain on the electrical performance of flexible a-In-Ga-Z-O (a-IGZO) thin-film transistor (TFT). Positive bias stress (PBS) measurement with Vgs = 20 V and Vds = 0 V in a-IGZO TFTs show positive transfer shift due to the trapping of negative charges, likely electron trapping. We observed that tensile strained TFT with 2 mm bending radius exhibits a positive ΔVTh (V) ~2.3 V shift compared to flat condition TFT (ΔVth (V) ~1.5 V) after 3.6K seconds stress. It clearly revels that more charges are trapped at the gate insulator/a-IGZO interface when the Fermi level is shifted downward by PBS with strained geometry.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
