Use of back gate bias to enhance the analog performance of planar FD and UTBB SOI transistors-based self-cascode structures

R. Doria, D. Flandre, R. Trevisoli, M. de Souza, M. Pavanello
{"title":"Use of back gate bias to enhance the analog performance of planar FD and UTBB SOI transistors-based self-cascode structures","authors":"R. Doria, D. Flandre, R. Trevisoli, M. de Souza, M. Pavanello","doi":"10.1109/SBMICRO.2015.7298134","DOIUrl":null,"url":null,"abstract":"This paper reports, for the first time, the use of back gate bias to improve the intrinsic voltage gain of self-cascode structures composed by planar FD and UTBB SOI MOSFETs. It is shown a voltage gain improvement larger than 10 dB when either a forward back bias is applied to the drain-side transistor or a reverse back bias is applied to the source side device.","PeriodicalId":342493,"journal":{"name":"2015 30th Symposium on Microelectronics Technology and Devices (SBMicro)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 30th Symposium on Microelectronics Technology and Devices (SBMicro)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SBMICRO.2015.7298134","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

This paper reports, for the first time, the use of back gate bias to improve the intrinsic voltage gain of self-cascode structures composed by planar FD and UTBB SOI MOSFETs. It is shown a voltage gain improvement larger than 10 dB when either a forward back bias is applied to the drain-side transistor or a reverse back bias is applied to the source side device.
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利用后门偏置增强平面FD和UTBB SOI晶体管自级联码结构的模拟性能
本文首次报道了利用反向偏置提高由平面FD和UTBB SOI mosfet组成的自级联码结构的固有电压增益。结果显示,当漏极侧晶体管施加正向反偏置或源侧器件施加反向反偏置时,电压增益提高大于10 dB。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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