Accurate Gate Charge Modeling of HV LDMOS Transistors for Power Circuit Applications

Xiaorui Jie, R. V. Langevelde, K. Xia, Lei Chao, C. McAndrew, Qilin Zhang, Matthew Bacchi, Wuxia Li
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Abstract

Accurate modeling of the gate-drain capacitance Cgd for HV LDMOS transistors is important but is challenging because of its strong bias dependence. We present an improved Cgd model, based on the physics that the drift region under the poly-gate is fully depleted at high Vdg, and validate our model against gate charge measurements for both n-and p-type 90V LDMOS transistors.
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用于功率电路的高压LDMOS晶体管栅极电荷精确建模
高压LDMOS晶体管栅极-漏极电容Cgd的精确建模非常重要,但由于其具有很强的偏置依赖性,因此具有挑战性。我们提出了一个改进的Cgd模型,基于在高Vdg下多栅极下的漂移区域完全耗尽的物理特性,并通过n型和p型90V LDMOS晶体管的栅极电荷测量验证了我们的模型。
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