Impacts of diameter and Ge content variation on the performance of Si1−xGex p-channel gate-all-around nanowire transistors

Abstract

In this work, the impacts of both nanowire diameter (Dnw) and Ge content (%) on the performance of Si1−xGex Gate-All-Around nanowire p-channel FETs (GAA pNWTs) are investigated. The variations in SiGe GAA pNWTs induced by Dnw variation, Ge content variation and some stochastic process variations including of random dopants fluctuation (RDF), gate edge roughness (GER), and metal gate granularity (MGG) are also simulated.