Raman spectroscopy study on free-standing GaN separated from sapphire substrates by 532 nm Nd:YAG laser lift-off

H. Ho, K. Lo, G. Siu, C. Surya
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Abstract

Gallium nitride (GaN) thin films grown on sapphire substrates were successfully lifted onto silicon wafers using a laser lift-off (LLO) process induced by a 532 nm, Nd:YAG pulsed laser. Although the photon energy (2.33 eV) is much lower than the band gap of hexagonal GaN (3.41 eV), free-carriers absorption can heat up and consequently causes detachment of the GaN film from the sapphire substrate. Raman measurement conducted before and after LLO showed that the surface structure of the lifted GaN changed from hexagonal to a cubic structure.
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532 nm Nd:YAG激光从蓝宝石衬底分离独立GaN的拉曼光谱研究
利用532 nm Nd:YAG脉冲激光诱导的激光提升(LLO)工艺,成功地将生长在蓝宝石衬底上的氮化镓(GaN)薄膜提升到硅晶片上。虽然光子能量(2.33 eV)远低于六方氮化镓的带隙(3.41 eV),但自由载流子吸收会升温,从而导致氮化镓薄膜从蓝宝石衬底上脱离。在LLO前后进行的拉曼测量表明,提升GaN的表面结构由六边形变为立方结构。
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