{"title":"Possibility of SOI based super steep subthreshold slope MOSFET for ultra low voltage application","authors":"Takayuki Mori, J. Ida","doi":"10.1109/S3S.2013.6716550","DOIUrl":null,"url":null,"abstract":"Ultra Low Power (ULP) LSI's require the steep subthreshold slope (SS) MOSFET. However, the theoretical SS limit of the conventional MOSFET is 60mV/dec at the room temperature. Recently, devices which have the less than 60mV/dec SS, such as the Tunnel FET (TFET) and the Impact Ionization MOS (I-MOS), have been studied. In addition to those, the steep SS MOSFET's using the Floating-Body (FB) SOI have been proposed. In this work, we report our finding of the FB and the Body-Tied (BT) SOI MOSFET with the super steep SS (<; 1mV/Dec) characteristics with the 0.15um SOI. We also discuss the possibility of it as a switching device for the ultra low voltage application, where we consider that the three points are the issues to improve; reducing the operation voltage, increasing Ion/Ioff ratios which also pay attention keeping the low Ioff, controlling hysteresis characteristics.","PeriodicalId":219932,"journal":{"name":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2013.6716550","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Ultra Low Power (ULP) LSI's require the steep subthreshold slope (SS) MOSFET. However, the theoretical SS limit of the conventional MOSFET is 60mV/dec at the room temperature. Recently, devices which have the less than 60mV/dec SS, such as the Tunnel FET (TFET) and the Impact Ionization MOS (I-MOS), have been studied. In addition to those, the steep SS MOSFET's using the Floating-Body (FB) SOI have been proposed. In this work, we report our finding of the FB and the Body-Tied (BT) SOI MOSFET with the super steep SS (<; 1mV/Dec) characteristics with the 0.15um SOI. We also discuss the possibility of it as a switching device for the ultra low voltage application, where we consider that the three points are the issues to improve; reducing the operation voltage, increasing Ion/Ioff ratios which also pay attention keeping the low Ioff, controlling hysteresis characteristics.