Fabrication Of Self-Assembled GaAs/AIGaAs Quantum Dots By Low-Temperature Droplet Epitaxy

Chae-Deok Lee, Chanro Park, Hwack-Joo Lee, S. Park, Kyu‐Seok Lee, C. Park, S. Noh, N. Koguchi
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引用次数: 21

Abstract

The fabrication of nanometer-scale GaAs dots on AlGaAs layer by molecular beam epitaxy was demonstrated. Unlike the stress-driven transition of the three-dimensional growth mode in the lattice-mismatched system, the limited migration of Ga droplets on the AlGaAs layer grown at low substrate temperature was exploited to give rise to the formation of three-dimensional GaAs islands. The resulting GaAs dots show crater-like features having {111} facets. In micro-photoluminescence measurements of the buried structures, the emission spectra were clearly observed, and the sharp lines of the spectra might be considered as the exciton emissions from individual dots with various sizes.
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低温液滴外延法制备自组装GaAs/AIGaAs量子点
介绍了利用分子束外延技术在AlGaAs层上制备纳米级GaAs点的方法。与晶格错配体系中应力驱动的三维生长模式转变不同,在低衬底温度下生长的AlGaAs层上,Ga液滴的有限迁移被利用来形成三维GaAs岛。所得的砷化镓点显示出具有{111}切面的陨石坑状特征。在埋地结构的微光致发光测量中,可以清晰地观察到发射光谱,光谱中的锐线可以认为是不同大小的单个点的激子发射。
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