Structural Characteristics of Bi2Te3 and Sb2Te3 films on (001) GaAs Substrates grown by MOCVD

Jeongha Kim, Sung-Do Kwon, D. Jeong, B. Ju, Seok-Jin Yoon, Jin-Sang Kim
{"title":"Structural Characteristics of Bi2Te3 and Sb2Te3 films on (001) GaAs Substrates grown by MOCVD","authors":"Jeongha Kim, Sung-Do Kwon, D. Jeong, B. Ju, Seok-Jin Yoon, Jin-Sang Kim","doi":"10.1109/ICT.2006.331284","DOIUrl":null,"url":null,"abstract":"Metal organic vapour phase epitaxy has been investigated for growth of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> films on (001) GaAs substrates using trimethylbismuth, triethylantimony and diisopropyltelluride as metal organic sources. High resolution TEM and X-ray diffraction patterns revealed that films had single crystalline phases with a preferential c-orientation and layered structures resulting from the van der Waals bonding nature in these materials. By optimizing growth parameters such as precursor ratio, growth temperatures, and flow rate in reactor, we could obtain Seebeck coefficient of -160muVK<sup>-1</sup> for Bi<sub>2</sub>Te<sub>3</sub> and +110muVK<sup>-1</sup> for Sb<sub>2</sub>Te<sub>3</sub> films, respectively. The high Seebeck coefficient and atomistically smooth surface morphologies of these materials are promising for the fabrication of a few nm thick periodic Bi<sub>2</sub>Te<sub>3</sub>/Sb <sub>2</sub>Te<sub>3</sub>super lattice structures for thin film thermoelectric device applications","PeriodicalId":346555,"journal":{"name":"2006 25th International Conference on Thermoelectrics","volume":"131 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 25th International Conference on Thermoelectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICT.2006.331284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

Metal organic vapour phase epitaxy has been investigated for growth of Bi2Te3 and Sb2Te3 films on (001) GaAs substrates using trimethylbismuth, triethylantimony and diisopropyltelluride as metal organic sources. High resolution TEM and X-ray diffraction patterns revealed that films had single crystalline phases with a preferential c-orientation and layered structures resulting from the van der Waals bonding nature in these materials. By optimizing growth parameters such as precursor ratio, growth temperatures, and flow rate in reactor, we could obtain Seebeck coefficient of -160muVK-1 for Bi2Te3 and +110muVK-1 for Sb2Te3 films, respectively. The high Seebeck coefficient and atomistically smooth surface morphologies of these materials are promising for the fabrication of a few nm thick periodic Bi2Te3/Sb 2Te3super lattice structures for thin film thermoelectric device applications
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
MOCVD生长(001)GaAs衬底上Bi2Te3和Sb2Te3薄膜的结构特性
以三甲基铋、三乙基锑和二异丙基碲为金属有机源,研究了金属有机气相外延在(001)GaAs衬底上生长Bi2Te3和Sb2Te3薄膜的方法。高分辨率TEM和x射线衍射图显示,薄膜具有优先的c取向单晶相和层状结构,这是由于这些材料的范德华键性质造成的。通过优化前驱物比、生长温度、反应器流速等生长参数,可以得到Bi2Te3薄膜的Seebeck系数为-160muVK-1, Sb2Te3薄膜的Seebeck系数为+110muVK-1。这些材料具有较高的塞贝克系数和原子光滑的表面形貌,有望用于制造几nm厚的Bi2Te3/ sb2te3周期性超晶格结构,用于薄膜热电器件
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Combined Thermoelectric and Structure Characterizations of Patterned Nanowires FTIR Reflectivity spectra of Thermoelectric K2Sb8Se13 crystals Structural Characteristics of Bi2Te3 and Sb2Te3 films on (001) GaAs Substrates grown by MOCVD Enhanced Thermoelectric Performance of Nanostructured ZnO: A possibility of selective phonon scattering and carrier energy filtering by nanovoid structure High-temperature thermoelectric properties of Delafossite oxide CuRh1-xMgxO2
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1