{"title":"Interaction of multiple brushes on a slipring","authors":"R. A. Burton, R. G. Burton","doi":"10.1109/33.148499","DOIUrl":null,"url":null,"abstract":"The increase of contact resistance is calculated for brush contact on a slipring, segmented into a sequence of rectangular contact patches, evenly spaced. This approximates the condition of liquid-metal-wetted brushes where uniform contact may occur over the rectangular brush footprint. A Fourier series expansion shows that for wide spacing of the footprints a component of resistance arises from the fact that the current input is segmented. The resistance is mainly dependent upon the logarithm of spacing. As the separation becomes narrower than the contact bands, there is a drop in the segmentation component of resistance.<<ETX>>","PeriodicalId":368900,"journal":{"name":"Electrical Contacts - 1991 Proceedings of the Thirty-Seventh IEEE HOLM Conference on Electrical Contacts","volume":"260 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Contacts - 1991 Proceedings of the Thirty-Seventh IEEE HOLM Conference on Electrical Contacts","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/33.148499","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The increase of contact resistance is calculated for brush contact on a slipring, segmented into a sequence of rectangular contact patches, evenly spaced. This approximates the condition of liquid-metal-wetted brushes where uniform contact may occur over the rectangular brush footprint. A Fourier series expansion shows that for wide spacing of the footprints a component of resistance arises from the fact that the current input is segmented. The resistance is mainly dependent upon the logarithm of spacing. As the separation becomes narrower than the contact bands, there is a drop in the segmentation component of resistance.<>
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