Reliability aspects of thermally stable LaB/sub 6/-Au Schottky contacts to GaAs

J. Wurfl, J. K. Singh, H. Hartnagel
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引用次数: 5

Abstract

A systematic investigation of the reliability and the possible degradation mechanisms of Au-LaB/sub 6/ Schottky contacts to GaAs is presented. Due to a relatively large barrier height ( approximately=0.9 eV) LaB/sub 6/ Schottky contacts are particularly interesting for low leakage current device operation, even at elevated temperatures. The high thermal stability enables sophisticated fabrication processes in connection with ion implantation. The dependence of the contact reliability on certain annealing and processing techniques during device fabrication is demonstrated. Accelerated lifetime tests, in combination with electrical measurements and X-ray photoelectron spectroscopy (XPS) sputter profiling, have been performed, indicating that optimized technological parameters yield reliable contacts with good electrical characteristics.<>
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热稳定LaB/sub - 6/-Au - Schottky触点到GaAs的可靠性方面
系统地研究了Au-LaB/sub - 6/ Schottky触点对砷化镓的可靠性和可能的降解机制。由于相对较大的阻挡高度(约=0.9 eV), LaB/sub - 6/肖特基触点对于低漏电流器件操作特别有趣,即使在高温下也是如此。高热稳定性使得与离子注入相关的复杂制造工艺成为可能。说明了器件制造过程中接触可靠性对某些退火和加工工艺的依赖性。结合电学测量和x射线光电子能谱(XPS)溅射分析,进行了加速寿命测试,表明优化的技术参数产生了具有良好电学特性的可靠触点。
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