Phase separation in bulk InGaN and quantum wells grown by low pressure MOCVD

C. Tran, R. Karlicek, M. Schurman, T. Salagaj, A. Thompson, R. Stall
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引用次数: 1

Abstract

We have grown high quality InGaN layers and InGaN/GaN multiple quantum wells for blue LED applications. The degree of phase segregation of InGaN in bulk InGaN layers depends on the TMI and TMG flow rates as well as the growth temperature. Even for films without indium droplets on the surface, X-ray diffraction (XRD) reveals the coexistence of different indium compositions in the films. In this case photoluminescence of the films is red-shifted with respect to the wavelength calculated using the indium composition determined by XRD. The same observation is made for the multiple quantum wells, where phase segregation can significantly reduce interface abruptness.
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低压MOCVD生长的大块InGaN和量子阱的相分离
我们已经为蓝色LED应用开发了高质量的InGaN层和InGaN/GaN多量子阱。大块InGaN层中InGaN的相偏析程度取决于TMI和TMG的流动速率以及生长温度。即使对于表面没有铟滴的薄膜,x射线衍射(XRD)也显示了薄膜中不同铟成分的共存。在这种情况下,薄膜的光致发光相对于用XRD测定的铟成分计算的波长发生红移。对多量子阱进行了同样的观察,其中相偏析可以显著降低界面的突然性。
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