Physical modeling of NBTI: From individual defects to devices

G. Rzepa, W. Goes, G. Rott, K. Rott, M. Karner, C. Kernstock, B. Kaczer, H. Reisinger, T. Grasser
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引用次数: 21

Abstract

Given the rapid recovery of the degradation induced by bias-temperature stress, the understanding and modeling of NBTI has been a challenge for nearly half a century. With the introduction of the time-dependent defect spectroscopy (TDDS), NBTI could be studied at the single defect level, confirming that it is dominated by a collection of first-order reactions rather then the previously invoked reaction-diffusion mechanism. The most intriguing feature of these first-order processes is the wide distribution of their time constants, which can be visualized in capture/emission time (CET) maps. In the following we clarify the microscopic link between individual defects seen in TDDS studies and the response of a large ensemble visible in the CET maps. In particular, we show how the distribution of the individual defect parameters can be extracted from measurements on large-area devices.
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NBTI的物理建模:从单个缺陷到器件
由于偏温应力引起的退化可以迅速恢复,近半个世纪以来,对NBTI的理解和建模一直是一个挑战。随着时间依赖缺陷光谱(TDDS)的引入,NBTI可以在单缺陷水平上进行研究,证实了它是由一阶反应的集合主导的,而不是先前调用的反应扩散机制。这些一阶过程最有趣的特征是其时间常数的广泛分布,这可以在捕获/发射时间(CET)图中可视化。在下文中,我们阐明了TDDS研究中看到的单个缺陷与CET图中可见的大集合响应之间的微观联系。特别是,我们展示了如何从大面积器件的测量中提取单个缺陷参数的分布。
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