G. Rzepa, W. Goes, G. Rott, K. Rott, M. Karner, C. Kernstock, B. Kaczer, H. Reisinger, T. Grasser
{"title":"Physical modeling of NBTI: From individual defects to devices","authors":"G. Rzepa, W. Goes, G. Rott, K. Rott, M. Karner, C. Kernstock, B. Kaczer, H. Reisinger, T. Grasser","doi":"10.1109/SISPAD.2014.6931568","DOIUrl":null,"url":null,"abstract":"Given the rapid recovery of the degradation induced by bias-temperature stress, the understanding and modeling of NBTI has been a challenge for nearly half a century. With the introduction of the time-dependent defect spectroscopy (TDDS), NBTI could be studied at the single defect level, confirming that it is dominated by a collection of first-order reactions rather then the previously invoked reaction-diffusion mechanism. The most intriguing feature of these first-order processes is the wide distribution of their time constants, which can be visualized in capture/emission time (CET) maps. In the following we clarify the microscopic link between individual defects seen in TDDS studies and the response of a large ensemble visible in the CET maps. In particular, we show how the distribution of the individual defect parameters can be extracted from measurements on large-area devices.","PeriodicalId":101858,"journal":{"name":"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"21","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2014.6931568","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 21
Abstract
Given the rapid recovery of the degradation induced by bias-temperature stress, the understanding and modeling of NBTI has been a challenge for nearly half a century. With the introduction of the time-dependent defect spectroscopy (TDDS), NBTI could be studied at the single defect level, confirming that it is dominated by a collection of first-order reactions rather then the previously invoked reaction-diffusion mechanism. The most intriguing feature of these first-order processes is the wide distribution of their time constants, which can be visualized in capture/emission time (CET) maps. In the following we clarify the microscopic link between individual defects seen in TDDS studies and the response of a large ensemble visible in the CET maps. In particular, we show how the distribution of the individual defect parameters can be extracted from measurements on large-area devices.