An impact of process variation on supply voltage dependence of logic path delay variation

S. Nishizawa, T. Ishihara, H. Onodera
{"title":"An impact of process variation on supply voltage dependence of logic path delay variation","authors":"S. Nishizawa, T. Ishihara, H. Onodera","doi":"10.1109/VLSI-DAT.2015.7114534","DOIUrl":null,"url":null,"abstract":"Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.","PeriodicalId":369130,"journal":{"name":"VLSI Design, Automation and Test(VLSI-DAT)","volume":"108 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"VLSI Design, Automation and Test(VLSI-DAT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-DAT.2015.7114534","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
动态电压和频率缩放(DVFS)技术需要精确地观察关键路径延迟,以便在积极的电源电压缩放下稳健运行。逻辑路径包含几种类型的逻辑门,由于不同的逻辑门具有不同的电压依赖性,因此路径延迟具有电压依赖性。然而,对于过程变化引起的路径延迟的电压依赖性如何变化的研究还不够深入。本文描述了过程变化对路径延迟电压依赖性的影响。采用65纳米CMOS工艺制作的环形振荡器电路,对电压延迟曲线的工艺变化依赖性进行了评价和分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
A 127 fJ/conv. continuous-time delta-sigma modulator with a DWA-embedded two-step time-domain quantizer Biomedical devices and instruments for point-of-care diagnosis Cost challenges on the way to the Internet of Things An in-pixel equalizer with kTC noise cancellation and FPN reduction for time-of-flight CMOS image sensor A dual-edge sampling CES delay-locked loop based clock and data recovery circuits
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1