Simulation of current transport in highly doped semiconductor structures including the tunneling effect

J. Racko, V. Drobny, D. Donoval
{"title":"Simulation of current transport in highly doped semiconductor structures including the tunneling effect","authors":"J. Racko, V. Drobny, D. Donoval","doi":"10.1109/ASDAM.2000.889447","DOIUrl":null,"url":null,"abstract":"Novel semiconductor struclures with shrinking dimensions and increasing doping result in veiy steep interfaces. The implementation of quantum mechanical effects into the compact model characterizing the current flow is a necessity and considerably contributes to the siniulation of various non-standard effects. Thus the analysis of the dependence of the properties of a tunnel diode on the actual doping profile of the structure is straightfonard. In a tunneling diode with an abrupt doping profile, tunneling through the p+-n' junction is likely to be the dominant mechanism which controls the current flow through the interface. Simulation based on the drift-diffusion approximation is unable to give the corresponding electrical characteristics and results [ 1-71. Various complex analytical models describing the tunneling effect have been developed [8-91 but usually they do not take into account the whole complexity of mutual interactions of different mechanisms of the current flow through the interface. Therefore in our approach the tunneling effect is introduced into the simulator via modification of a general generation-recombination term. The resulting compact formula characterizing the total current flow includes the drift and diffusion, Shockley-Hall-Read generation and recombination, Auger recombination, impact ionization and tunneling as well as the mutual interactions of the mentioned mechanisms of current flow. The properties of the modified simulator were verified by its application to the simulation of the I-V properties of tunnel diodes with different doping profiles and the contribution of the tunneling current to the total current is clearly demonstrated. 2. Theory Adding the tunneling mechanism via an additional generation - recombination term into the current continuity equations modifies the classical drift-diffusion model of the simulation of electrical properties of semiconductor devices. We can then write","PeriodicalId":303962,"journal":{"name":"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)","volume":"73 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2000.889447","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Novel semiconductor struclures with shrinking dimensions and increasing doping result in veiy steep interfaces. The implementation of quantum mechanical effects into the compact model characterizing the current flow is a necessity and considerably contributes to the siniulation of various non-standard effects. Thus the analysis of the dependence of the properties of a tunnel diode on the actual doping profile of the structure is straightfonard. In a tunneling diode with an abrupt doping profile, tunneling through the p+-n' junction is likely to be the dominant mechanism which controls the current flow through the interface. Simulation based on the drift-diffusion approximation is unable to give the corresponding electrical characteristics and results [ 1-71. Various complex analytical models describing the tunneling effect have been developed [8-91 but usually they do not take into account the whole complexity of mutual interactions of different mechanisms of the current flow through the interface. Therefore in our approach the tunneling effect is introduced into the simulator via modification of a general generation-recombination term. The resulting compact formula characterizing the total current flow includes the drift and diffusion, Shockley-Hall-Read generation and recombination, Auger recombination, impact ionization and tunneling as well as the mutual interactions of the mentioned mechanisms of current flow. The properties of the modified simulator were verified by its application to the simulation of the I-V properties of tunnel diodes with different doping profiles and the contribution of the tunneling current to the total current is clearly demonstrated. 2. Theory Adding the tunneling mechanism via an additional generation - recombination term into the current continuity equations modifies the classical drift-diffusion model of the simulation of electrical properties of semiconductor devices. We can then write
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
高掺杂半导体结构中包括隧道效应的电流输运模拟
缩小尺寸和增加掺杂的新型半导体结构导致了非常陡峭的界面。在描述电流的紧致模型中实现量子力学效应是必要的,并且极大地有助于模拟各种非标准效应。因此,分析隧道二极管的性质对实际掺杂结构的依赖关系是直截了当的。在具有突变掺杂剖面的隧穿二极管中,通过p+-n′结的隧穿可能是控制电流通过界面的主要机制。基于漂移-扩散近似的仿真无法给出相应的电特性和结果[1-71]。描述隧道效应的各种复杂的分析模型已经被开发出来[8-91],但它们通常没有考虑到电流流过界面的不同机制相互作用的整体复杂性。因此,在我们的方法中,通过修改一般的生成重组项,将隧道效应引入模拟器。由此得到的描述总电流的紧凑公式包括漂移和扩散、肖克利-霍尔-里德产生和复合、俄歇复合、冲击电离和隧穿以及上述电流机制的相互作用。通过对不同掺杂情况下隧道二极管I-V特性的模拟,验证了改进后的模拟器的性能,并清楚地展示了隧道电流对总电流的贡献。2. 通过在电流连续性方程中增加一个生成-重组项,将隧穿机制加入到半导体器件电性能模拟的经典漂移-扩散模型中。我们可以这样写
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Ridge-waveguide InAs/GaAs lasers Transversal photovoltage in heterostructure and Schottky contact Process optimization and diffusion length evaluation of a new aqueous base developable negative epoxy electron beam resist Nature of the red photoluminescence in porous silicon Kinetics of surface processes arising in hydride pyrolysis and the problem of alloy intermixing near interfaces in Si(Ge)/Si/sub 1-x/Ge/sub x/ structures grown by gas source molecular beam epitaxy
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1