Fabrication of BiFeO3 capacitor structures with reduced leakage current

N. M. Murari, A. Kumar, R. Thomas, R. Katiyar
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引用次数: 3

Abstract

Multi layered metal-insulator-metal (MIM) structures with BiFeO3 (BFO) and Ba0.25Sr0.75TiO3 (BST) thin films were fabricated by chemical solution deposition. Crystalline structure of BFO was recognized as rhombohedral and was not influenced by the BST intermediate layer. Compared to the homogenous BFO, in the heterostructures, coercivity increased and saturation magnetization reduced. BST intermediate layer between the substrate and BFO layer resulted in the leakage current reduction by 3 orders of magnitude. The frequency and temperature dependent dielectric properties showed space charge accumulation between the layer of BST and BFO, and hence Maxwell-Wagner type dispersion.
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低漏电流BiFeO3电容器结构的制备
采用化学溶液沉积法制备了具有BiFeO3 (BFO)和Ba0.25Sr0.75TiO3 (BST)薄膜的多层金属-绝缘体-金属(MIM)结构。BFO的晶体结构为菱形,不受BST中间层的影响。与均相BFO相比,异质结构中矫顽力增加,饱和磁化强度降低。衬底与BFO层之间的BST中间层使漏电流降低了3个数量级。频率和温度相关的介电性质表现为BST和BFO层之间的空间电荷积累,从而导致Maxwell-Wagner型色散。
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