Evaluation and Modeling of Voltage Stress-Induced Hot Carrier Effects in High-Speed SiGe HBTs

G. Sasso, C. Maneux, J. Boeck, V. d’Alessandro, K. Aufinger, T. Zimmer, N. Rinaldi
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引用次数: 4

Abstract

Hot-carrier degradation analysis and modeling of 240/380 GHz fT/fMAX SiGe HBTs are addressed. A proper stress bias setup is proposed, suitable for the evaluation of RF performance during stress interruption. The impact of stress conditions, lateral scaling and device layout is discussed. An analytical model is proposed, which predicts base current degradation, including its dependence upon stress voltage, stress duration, and emitter geometry, and contributes to understand the physical background of the phenomena.
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高速SiGe HBTs中电压应力诱导热载子效应的评估与建模
对240/380 GHz fT/fMAX SiGe hbt进行了热载流子退化分析和建模。提出了一种合适的应力偏置设置,适用于应力中断时射频性能的评估。讨论了应力条件、横向结垢和器件布置的影响。提出了一个解析模型,该模型可以预测基极电流的退化,包括其对应力电压、应力持续时间和发射极几何形状的依赖,并有助于理解这种现象的物理背景。
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