Sub-micron InGaAs Esaki diodes with record high peak current density

D. Pawlik, M. Barth, P. Thomas, S. Kurinec, S. Mookerjea, D. Mohata, S. Datta, S. Cohen, D. Ritter, S. Rommel
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引用次数: 12

Abstract

Tunneling field effect transistors (TFET), which are gated Esaki tunnel junctions (ETD) operating in the Zener regime, have theoretically been predicted to operate with ultra low power supplies (<0.5 V) and steep subthreshold slopes (<60 mV/dec) [1, 2]. However, the majority of these projections have been made based on uncalibrated TCAD modeling. To this end, the authors experimentally demonstrate a pair of InGaAs tunnel diodes with the highest peak current densities (JP = IP/Area) ever reported for tunnel diodes (975 kA/cm2 or 9.75 mA/µm2) [3–5]. Other groups have attempted to experimentally demonstrate these structures, but were limited by a combination of output current and series resistance [6]. The key innovation in this study was a process for testing deep submicron Esaki diodes [7], which mitigates these factors.
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亚微米InGaAs Esaki二极管具有创纪录的高峰值电流密度
隧道场效应晶体管(ttfet)是一种门控Esaki隧道结(ETD),工作在齐纳状态下,理论上预测它可以在超低电源(<0.5 V)和陡峭的亚阈值斜率(<60 mV/dec)下工作[1,2]。然而,这些预测大多是基于未校准的TCAD模型做出的。为此,作者通过实验展示了一对具有最高峰值电流密度(JP = IP/Area)的InGaAs隧道二极管(975 kA/cm2或9.75 mA/µm2)的隧道二极管[3-5]。其他研究小组也曾尝试通过实验证明这些结构,但受到输出电流和串联电阻组合的限制[6]。本研究的关键创新是测试深亚微米Esaki二极管的过程[7],该过程减轻了这些因素。
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