{"title":"Control of charge-up on insulating glass in vacuum due to plasma processing","authors":"H. Fujii","doi":"10.1109/DEIV.2000.879097","DOIUrl":null,"url":null,"abstract":"In order to control charge-up on insulating glasses used for high-voltage vacuum equipment, H/sub 2/ plasma processing on the glass surface was studied. Borosilicate glass plates were used as test samples. The glasses were exposed to H/sub 2/ plasma produced by AC (60 Hz) voltage application. The surface resistivity of the glass was deceased with H/sub 2/ plasma processing time. By H/sub 2/ plasma exposure for 20 minutes, the surface resistivity was reduced from 10/sup 17/ /spl Omega/ to 10/sup 12/ /spl Omega/. Due to the reduction of the surface resistivity, charge-up of the glass irradiated by electron beam can be controlled to the level not to cause surface flashover.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2000.879097","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In order to control charge-up on insulating glasses used for high-voltage vacuum equipment, H/sub 2/ plasma processing on the glass surface was studied. Borosilicate glass plates were used as test samples. The glasses were exposed to H/sub 2/ plasma produced by AC (60 Hz) voltage application. The surface resistivity of the glass was deceased with H/sub 2/ plasma processing time. By H/sub 2/ plasma exposure for 20 minutes, the surface resistivity was reduced from 10/sup 17/ /spl Omega/ to 10/sup 12/ /spl Omega/. Due to the reduction of the surface resistivity, charge-up of the glass irradiated by electron beam can be controlled to the level not to cause surface flashover.
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