Thickness-dependent leakage current of (PVDF/PbTiO/sub 3/) pyroelectric bilayer thin film detectors

M. Kao, C. Wang, Y. Chen
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Abstract

The novel pyroelectric infrared (IR) detectors have been fabricated using the Polyvinylidene Fluoride (PVDF)/Lead Titanate (PT) pyroelectric bilayer thin films which were deposited onto Pt(111)/SiO/sub 2//Si(100) substrates by a sol-gel process. The ceramic/polymer structure was constructed of the randomly oriented polycrystalline PT film(/spl sim/1 /spl mu/m) heated at 700/spl deg/C for 1 h and the /spl beta/-phase PVDF film crystallized at 65/spl deg/C for 2 h. The effects of PVDF thin film thickness (100/spl sim/580 nm) on the pyroelectric response of IR detectors were studied. The results show that the depositions of PVDF thin films onto the PT films will cause the leakage current (J) of the detectors decrease from 6.37 /spl times/ 10/sup -7/ A/cm/sup 2/ to 3.86 /spl times/ 10/sup -7/ A/cm/sup 2/. The specific detectivity (D*) measured at 100 Hz decreased from 2.72 /spl times/ 10/sup -7/ cm/spl middot/Hz/sup 1/2//W for detector without PVDF to 1.71 /spl times/ 10/sup -7/ cm/spl middot/Hz/sup 1/2//W for detector with PVDF thickness of 580 nm. By optimizing the ratio of the specific detectivity (D*) to leakage current, D*/J, the detector with PVDF thickness of 295 nm exhibits the best performance.
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(PVDF/PbTiO/ sub3 /)热释电双层薄膜探测器的厚度相关漏电流
采用溶胶-凝胶法将聚偏氟乙烯(PVDF)/钛酸铅(PT)热释电双层薄膜沉积在PT (111)/SiO/sub 2/ Si(100)衬底上,制备了新型热释电红外(IR)探测器。将随机取向多晶PT薄膜(/spl sim/1 /spl mu/m)在700/spl℃下加热1 h, /spl β /-相PVDF薄膜在65/spl℃下结晶2 h,构建陶瓷/聚合物结构。研究了PVDF薄膜厚度(100/spl sim/580 nm)对红外探测器热释电响应的影响。结果表明,PVDF薄膜在PT薄膜上的沉积使探测器的漏电流J从6.37 /spl次/ 10/sup -7/ A/cm/sup 2/降低到3.86 /spl次/ 10/sup -7/ A/cm/sup 2/。在100 Hz下测得的比检出率(D*)由无PVDF的2.72 /spl times/ 10/sup -7/ cm/spl middot/Hz/sup 1/2//W降至PVDF厚度为580 nm的1.71 /spl times/ 10/sup -7/ cm/spl middot/Hz/sup 1/2//W。通过优化比探测率(D*)与漏电流(D* /J)的比值,得到PVDF厚度为295 nm的探测器性能最佳。
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