A high performance low temperature 0.3 mu m CMOS on SIMOX

G. Shahidi, B. Davari, T. Bucelot, D. Zicherman, P. McFarland, A. Fink, S. Brodsky, K. Pettrilo, N. Mazzeo, R. Lombardi, M. Rodriguez, M. Polcari, T. Ning
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引用次数: 1

Abstract

It is shown that ultrathin SOI offers a device design advantage for operation of CMOS circuits at 77 K. The use of ultrathin SOI makes it possible to achieve low threshold at relatively high channel doping, which is necessary for reduction of short channel effects. Very-high-performance loaded NAND inverters (with delays of less than 100 ps at 2 V) were fabricated.<>
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一种基于SIMOX的高性能低温0.3 μ m CMOS
结果表明,超薄SOI在77 K下的CMOS电路中具有器件设计优势。超薄SOI的使用使得在相对高的通道掺杂下实现低阈值成为可能,这是减少短通道效应所必需的。制作了高性能负载NAND逆变器(在2 V时延迟小于100 ps)。
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