{"title":"Plasma mode influences on the surface hydrophobization of polyimide","authors":"Letao Zhang, Hongyang Zuo, Qian Ma, Shengdong Zhang, Liangfen Zhang, Xiao-xing Zhang, Y. Hsu","doi":"10.23919/AM-FPD.2019.8830553","DOIUrl":null,"url":null,"abstract":"Polyimide (PI) based photo-resistance films were treated by different CF4 plasma modes to serve as a bank material for inkjet printing OLED. The original PI film shows a moderate hydrophobicity with a 23.8° contact angle for PGMEA. However, the surface of PI film will become hydrophobic after treated by CF4 plasma with PE mode. In contrast, CF4 plasma with etch mode is apt to form a hydrophilic PI surface because of the ion bombardment.","PeriodicalId":129222,"journal":{"name":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD.2019.8830553","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Polyimide (PI) based photo-resistance films were treated by different CF4 plasma modes to serve as a bank material for inkjet printing OLED. The original PI film shows a moderate hydrophobicity with a 23.8° contact angle for PGMEA. However, the surface of PI film will become hydrophobic after treated by CF4 plasma with PE mode. In contrast, CF4 plasma with etch mode is apt to form a hydrophilic PI surface because of the ion bombardment.
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