Tunnel field-effect transistors - status and prospects

A. Seabaugh
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引用次数: 6

Abstract

This paper reviews recent progress in the development of tunnel field-effect transistors (TFETs) [1–5] toward achieving channel currents comparable to high performance MOSFETs at supply voltages less than 0.5 V and subthreshold swing less than 60 mV/decade, for logic applications. To enable high performance in TFETs, development of narrow bandgap III–V and graphene nanoribbon (GNR) channels is indicated. Beyond the switch, the tunnel junction could provide enhanced functionality and new ways to integrate logic and memory [6].
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隧道场效应晶体管的现状与展望
本文回顾了隧道场效应晶体管(tfet)的最新进展[1-5],以期在电源电压小于0.5 V、亚阈值摆幅小于60 mV/ 10年的情况下实现与高性能mosfet相当的通道电流,用于逻辑应用。为了在tfet中实现高性能,建议开发窄带隙III-V和石墨烯纳米带(GNR)通道。除了交换机之外,隧道结还可以提供增强的功能和集成逻辑和存储器的新方法[6]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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Recent progress in GaN FETs on silicon substrate for switching and RF power applications Room temperature nonlinear ballistic nanodevices for logic applications III–V FET channel designs for high current densities and thin inversion layers High retention-time nonvolatile amorphous silicon TFT memory for static active matrix OLED display without pixel refresh Non-volatile spin-transfer torque RAM (STT-RAM)
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