Silicon-carbide Schottky diodes with sputtered and laser-ablated thin-Pt gate as NO gas sensors in high temperature

S. A. Khan, G. Wei, E. A. de Vasconcelos, H. Uchida, T. Katsube
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Abstract

We fabricated thin catalytic metal gate Schottky diodes prepared with Pt gates deposited by sputter and laser ablation method on SiC substrates responding to NO gas at high temperature. Schottky barrier height, ideality factor and series resistance were evaluated from linear G/I/spl times/G plots. Upon exposure to NO gas, the barrier height decreased, ideality factor increased and series resistance decreased and as a whole effect, forward current of the devices was increased. Change of barrier height was larger for 4H-SiC Schottky diodes than 6H-SiC Schottky diodes. The devices were tested for NO gas concentrations from 5 ppm to 50 ppm and showed reversible and stable response at temperatures up to 450/spl deg/C.
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具有溅射和激光烧蚀薄铂栅极的碳化硅肖特基二极管作为高温NO气体传感器
采用溅射法和激光烧蚀法在SiC衬底上沉积Pt栅极,在NO气体的高温下制备了催化金属栅极肖特基二极管。利用线性G/I/spl次/G图评估肖特基势垒高度、理想因子和串联电阻。暴露于NO气体后,阻挡层高度降低,理想系数增大,串联电阻减小,整体效应是器件正向电流增大。4H-SiC肖特基二极管的势垒高度变化大于6H-SiC肖特基二极管。测试结果表明,该装置在NO气体浓度为5 ppm至50 ppm的情况下,在高达450℃的温度下表现出可逆和稳定的响应。
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