Silicon unipolar photoconductor

S. R. in 't Hout, S. Middelhoek
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Abstract

A novel silicon photoconductor is presented which is sensitive to light only for one current direction. When the current is reversed its sensitivity to light is drastically reduced. This unique unipolar behavior allows for autocalibration, that is, the dark resistance of the photoconductor can be measured on line simply by reversing the bias current. Regular photoconductors do not show such a unipolar sensitivity and therefore require light chopping for the dark resistance to be measured. This new type of photoconductor can thus be used for applications similar to those for which regular photoconductors are used, but also for applications which require autocalibration. For example, the unipolar principle can be used in photoconductive HgCdTe infrared detectors which require measurement of the dark resistance because the material conducts relatively well even in the absence of infrared radiation. The unipolar photoconductor is a bulk type device consisting of a highly doped p-type silicon point contact on a low-doped p-type silicon substrate. A large-area ohmic contact is made at the bottom of the substrate and serves as a second contact to the device. The principle of operation is based on the effect of minority carrier accumulation2" at high-low junctions (p'p or n ' n junctions). High-low junctions present a small potential step which is a significant barrier for minority carriers but does not restrict the flow of majority carriers. Minority carriers flowing towards the highly doped region meet the potential barrier and thus accumulate near the junction lowering the local resistivity of the material. This effect is exploited in the photoconductor as follows. When the bias current is directed such that the holes (majority carriers) flow away from the point contact, which forms a high-low junction with the substrate, and the electrons (minority carriers) flow towards it, photogenerated excess electrons near the point contact will flow towards the point contact where they accumulate and lower the resistance of the device. When the current is reversed the photogenerated electrons flow away from the point contact into the bulk where they have little influence on the device resistance. The device was realized having a 6x6 pm square point contact with a doping level of approximately 1019 cm-3 on a 525 pm thick substrate with a doping level of about loi5 ~ m ~ , The dark resistance was about 10 kQ for both current directions. Sensitivity measurements were performed in a dark room using a 550 nm wavelength monochromatic light source varying the illumination power between 0.01 and 30 W/m2. Since the accumulation effect is strongly current dependent, the sensitivity was measured with currents varying from l FA up to 2 mA for both current directions. Optimal performance was observed for a bias current of 200 pA at which the resistance at 10 W/m2 illumination power decreased by about 75% for the sensitive current direction and only about 5% for the insensitive current direction.
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硅单极光导体
提出了一种新型硅光导体,它只对一个电流方向的光敏感。当电流反向时,它对光的灵敏度就大大降低了。这种独特的单极行为允许自动校准,也就是说,光导体的暗电阻可以简单地通过反转偏置电流在线测量。普通的光导体不表现出这样的单极灵敏度,因此需要切光来测量暗电阻。因此,这种新型光导体可以用于类似于使用常规光导体的应用,也可以用于需要自动校准的应用。例如,单极原理可用于光导HgCdTe红外探测器,该探测器需要测量暗电阻,因为即使在没有红外辐射的情况下,材料的导电性也相对较好。单极光导体是在低掺杂p型硅衬底上由高掺杂p型硅点接触组成的体型器件。大面积欧姆触点在基板底部形成,并作为器件的第二触点。工作原理是基于在高低结(p'p或n ' n结)的少数载流子积累的影响。高低结呈现出一个小的潜在步骤,这是少数载流子的重要障碍,但不限制多数载流子的流动。流向高掺杂区域的少数载流子遇到势垒,从而在结附近积聚,降低了材料的局部电阻率。这种效应在光导体中被利用如下。当偏置电流的方向使空穴(多数载流子)从点接触处流出,与衬底形成高低结,电子(少数载流子)流向它时,点接触附近光产生的多余电子将流向点接触处,在那里它们积累并降低器件的电阻。当电流反向时,光产生的电子从点接触流到体中,在那里它们对器件电阻的影响很小。该器件在525 pm厚、掺杂水平约为loi5 ~ m ~的衬底上实现了6 × 6 pm的方点接触,掺杂水平约为1019 cm-3,两个电流方向的暗电阻均约为10 kQ。灵敏度测量在暗室中进行,使用波长为550 nm的单色光源,照明功率在0.01至30 W/m2之间。由于积累效应强烈依赖于电流,因此在两个电流方向上测量灵敏度时,电流从1 FA到2 mA不等。当偏置电流为200 pA时,在10 W/m2照明功率下,敏感电流方向的电阻下降了约75%,而不敏感电流方向的电阻仅下降了约5%。
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