Gallium phosphide nanowires for optoelectronic devices

Umesh Rizal, B. Swain, B. S. Swain
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引用次数: 1

Abstract

Gallium phosphide nanowires (GaP-NWs) were synthesized via oxide assisted growth mechanism in a chemical vapor deposition (CVD) and their optoelectronic properties were studied. The diameters of nanowires were in the range of 20-80 nm and lengths extended up to tens of micrometers. Raman spectra studies of GaP-NWs reveal broad and intense peaks at 364 and 398 cm-1 confirmed from transverse optic (TO) and longitudinal optics (LO) phonon. High resolution (HR) X-ray diffraction (XRD) reveals an addition peak that indicates presence of silicon in chemical network of GaP-NWs. Photoluminescence spectra shows intense PL peaks, indicating their potential applications in optoelectronic devices.
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光电器件用磷化镓纳米线
采用化学气相沉积(CVD)的氧化辅助生长机制合成了磷化镓纳米线(GaP-NWs),并对其光电性能进行了研究。纳米线的直径在20 ~ 80 nm之间,长度可达数十微米。横向光学(TO)和纵向光学(LO)声子证实了GaP-NWs在364和398 cm-1处的宽而强的拉曼光谱。高分辨(HR) x射线衍射(XRD)结果表明,在GaP-NWs的化学网络中存在硅的附加峰。光致发光光谱显示出强烈的PL峰,表明其在光电器件中的潜在应用。
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