Application of the time domain current response method to the examination of dysprosium oxide capacitors

T. Wiktorczyk, Z. Bober, K. Nitsch
{"title":"Application of the time domain current response method to the examination of dysprosium oxide capacitors","authors":"T. Wiktorczyk, Z. Bober, K. Nitsch","doi":"10.1109/ICSD.1989.69189","DOIUrl":null,"url":null,"abstract":"The authors report the results of time-domain current response measurements of Al/Dy/sub 2/O/sub 3//Al sandwiches and of the evaluation of their complex capacitance in the frequency domain. The observed dielectric response comes either from the volume of dysprosium oxide thin film or from the interfacial layers at both metal/insulator boundaries. In general, the volume of Dy/sub 2/O/sub 3/ film is responsible for the dielectric response at high frequencies and lower temperatures, whereas Al/Dy/sub 2/O/sub 3/ boundaries have an effect at low frequencies and high temperatures. The C\"(f) peaks appear as the consequence of the interaction of volume and interfacial processes. Multihour annealing of samples at 523 K reduces the electrical conductivity, shifts the C\" peaks toward low frequencies without changing their activation energy, and slightly modifies the shape of the dispersion curves, lowering the values of their slopes.<<ETX>>","PeriodicalId":184126,"journal":{"name":"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSD.1989.69189","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

The authors report the results of time-domain current response measurements of Al/Dy/sub 2/O/sub 3//Al sandwiches and of the evaluation of their complex capacitance in the frequency domain. The observed dielectric response comes either from the volume of dysprosium oxide thin film or from the interfacial layers at both metal/insulator boundaries. In general, the volume of Dy/sub 2/O/sub 3/ film is responsible for the dielectric response at high frequencies and lower temperatures, whereas Al/Dy/sub 2/O/sub 3/ boundaries have an effect at low frequencies and high temperatures. The C"(f) peaks appear as the consequence of the interaction of volume and interfacial processes. Multihour annealing of samples at 523 K reduces the electrical conductivity, shifts the C" peaks toward low frequencies without changing their activation energy, and slightly modifies the shape of the dispersion curves, lowering the values of their slopes.<>
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
时域电流响应法在氧化镝电容器检测中的应用
本文报道了Al/Dy/sub - 2/O/sub - 3/ Al三夹层的时域电流响应测量结果及其频域复电容的评价结果。所观察到的介电响应要么来自氧化镝薄膜的体积,要么来自金属/绝缘体边界的界面层。一般来说,Dy/sub 2/O/sub 3/薄膜的体积对高频和低温下的介电响应负责,而Al/Dy/sub 2/O/sub 3/边界对低频和高温下的介电响应有影响。C′(f)峰的出现是体积和界面过程相互作用的结果。在523 K下对样品进行数小时的退火,降低了电导率,在不改变其活化能的情况下将C"峰向低频移动,并稍微改变了色散曲线的形状,降低了它们的斜率值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
On the mechanism of partial discharges in gaseous cavities in contact with solid or liquid insulators The initiation and growth of AC tree in polyethylene Effects of the field dependent occupation of electrical-stress-generated traps on the conduction and breakdown of thin SiO/sub 2/ films A model of the electrical breakdown process due to electrical treeing growth Dielectric breakdown and partial discharge in BaTiO/sub 3/ ceramics
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1