Electrical observation of one dimensional sub-band structure of carbon nanotube in schottky barrier transistor

T. Kamimura, M. Maeda, Y. Nagamune, T. Nakanishi, K. Matsumoto
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Abstract

We have succeeded in observing the one dimensional sub-band structure of single walled carbon nanotube (SWNT) in the electrical measurement through the quantum capacitance effect, which could be observed even at room temperature. The sample structure was shown in Fig. 1. The SWNT was grown by chemical vapor deposition on a p-type silicon wafer with a thennally grown oxide. Pt/Au electrodes were deposited on the both side of the SW-NT for source and drain, and the back side of Si substrate for the gate. The channel length was 4 1tm. Thus, the back gate type SWNT-FET was fabricated. The left axis of Fig. 2 shows the gate voltage VG dependence of the drain Schottky barrier height of the SWNT-FET after the elimination of the adsorbed oxygen molecules by applying the Electrical Heating Process (EHP) I"2]. The SWNT-FET after EHP operates as a Schottky barrier transistor (SWNT-SBT). The barrier height qP was as large as qpB=1OO meV at VG-40 V. (The inset of Fig. 2 shows the band diagram at VG-40V near the drain contact.) The right axis of Fig. 2 shows the drain current IDVG characteristic of the SWNT-SBT with the constant drain voltage VD of I V, which indicates the ambipolar characteristics. Further increase of the drain voltage up to VD=10 V at 8.6 K, current step characteristics became appeared in the semi-logarithmic ID-VGcharacteristics as shown in Fig. 3, which are attributed to the oscillation characteristics of the quantum capacitance CQ [31. The gate capacitance consists of two components, one is the insulator capacitance Ci, which is originated from the geometry of the SWNT-SBT. And the other is the quantum capacitance CQ which is originated from the one dimensional sub-band structure of SWNT. In the present device, the CQ limits the operation of the device. The current step characteristics are resulted in the fact that the drain Schottky barrier is modulated stepwise by the effect of the quantum capacitance CQ. The CQ has the oscillation property corresponded to the saw teeth structure of the one dimensional sub-band structure of SWNT as shown in Fig. 4. Therefore, the current step characteristics in Fig. 3 indicate directly the sub-band structure in SWNT. The ratio of the gradients of the drain current IDin Fig. 3 at the step region and the slope region was estimated to be 3, which is almost in agreement with the ratio of the maximum and minimum of the CQ. The gate modulation coefficient a (which implies the ratio of the applied V0 and modulated potential energy in the SWNT-SBT) was estimated to be 0.071 from the other experimental results with the same sample structure device (not shown). Moreover, step width of the current step characteristics is about MaV6=0.5 eV, which is also in good agreement with the typical sub-band energy separation of 0.5 eV ofSWNT. Although a larger noise was superimposed, similar current step characteristics were also observed even at room temperature, owing to the large sub-band energy separation compared to the thermal energy of25 meV. This measurement technology includes a large potential to identify the chirality ofthe individual SWNT even after the fabrication ofthe electrical device.
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肖特基势垒晶体管中碳纳米管一维子带结构的电学观察
我们利用量子电容效应在电测量中成功地观察到了单壁碳纳米管(SWNT)的一维亚带结构,这种亚带结构即使在室温下也能观察到。样品结构如图1所示。采用化学气相沉积的方法在p型硅片上生长SWNT。Pt /非盟电极沉积的双方SW-NT源和流失,和Si衬底的背面。通道长度为4.1 tm。由此制备了后栅型单壁纳米管场效应晶体管。图2的左轴表示在应用电加热过程(EHP)去除吸附的氧分子后,SWNT-FET的栅极电压VG与栅极肖特基势垒高度的关系。EHP后的SWNT-FET作为肖特基势垒晶体管(SWNT-SBT)工作。在VG-40V时势垒高度qP高达qpB= 100mev(图2的插入部分为漏极接点附近VG-40V处的能带图)。图2中右轴为漏极电压VD为I V时,SWNT-SBT漏极电流IDVG特性,为双极特性。在8.6 K下,将漏极电压进一步提高至VD=10 V,则在图3所示的半对数id - vg特性中出现电流阶跃特性,这是由于量子电容CQ的振荡特性[31]。栅极电容由两个分量组成,一个是绝缘子电容Ci,它源于SWNT-SBT的几何形状。另一种是量子电容CQ,它来源于单壁碳纳米管的一维子带结构。在目前的设备,CQ限制的操作设备。电流阶跃特性是由于漏极肖特基势垒在量子电容CQ的作用下被逐步调制而产生的。CQ具有与SWNT一维子带结构的锯齿结构相对应的振荡特性,如图4所示。因此,图3中的电流阶跃特征直接反映了SWNT的子带结构。图3中漏极电流在阶跃区和斜率区的梯度之比估计为3,这与CQ的最大值和最小值之比基本一致。栅极调制系数a(表示SWNT-SBT中施加的V0与调制势能的比值)根据相同样品结构器件的其他实验结果估计为0.071(未示出)。此外,电流阶跃特性的阶跃宽度约为MaV6=0.5 eV,这也与swnt典型的0.5 eV子带能量分离符合得很好。虽然叠加了更大的噪声,但即使在室温下也观察到类似的电流阶跃特征,这是由于与25 meV的热能相比,子带能量分离较大。这种测量技术具有很大的潜力,可以识别单个SWNT的手性,即使是在电子器件制造之后。
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