{"title":"Advancements in Image Pattern Recognition for Lock-In Thermography Hotspot Detection and Classification with Supervised Learning","authors":"K. K. Thinn, Teh Tict Eng, Ming Xue, Rui Zhen Tan","doi":"10.31399/asm.edfa.2023-3.p004","DOIUrl":null,"url":null,"abstract":"\n Lock-in thermography (LIT) is a widely used nondestructive tool for detecting the failure location in integrated circuits. The image pattern recognition algorithm for detecting LIT hotspots benefits image processing and can be leveraged to automate failure analysis processes.","PeriodicalId":431761,"journal":{"name":"EDFA Technical Articles","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"EDFA Technical Articles","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.edfa.2023-3.p004","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Lock-in thermography (LIT) is a widely used nondestructive tool for detecting the failure location in integrated circuits. The image pattern recognition algorithm for detecting LIT hotspots benefits image processing and can be leveraged to automate failure analysis processes.
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