Design of 3C-SiC symmetric and asymmetric double gate MOSFET

Sudarshana Jilowa, S. S. Gill, G. K. Walia
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引用次数: 2

Abstract

The superior material properties such as higher breakdown field, thermal conductivity and wider bandgap make Silicon Carbide (SiC) appropriate for transistor applications. However, there are certain parameters where SiC have yet to achieve required performance levels. SiC have number of polytypes having mature technology. Being one of the SiC polytypes, 3C-SiC has higher mobility and saturation velocity. This paper presents symmetric 3C-SiC Double Gate MOSFET (DG MOSFET) and asymmetric 3C-SiC DG MOSFET. The two designs were simulated for different applied voltage at various lengths. From simulated results it can be seen that asymmetric 3C-SiC DG MOSFET shows increment in on-current values and decrement in off-current values for 22 nm, 40 nm and 60 nm channel length.
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3C-SiC对称和非对称双栅MOSFET的设计
碳化硅(SiC)具有更高的击穿场、导热性和更宽的带隙等优越的材料性能,适合晶体管应用。然而,在某些参数中,SiC尚未达到所需的性能水平。碳化硅有许多多型,技术成熟。作为SiC多型之一,3C-SiC具有较高的迁移率和饱和速度。本文介绍了对称型3C-SiC双栅MOSFET (DG MOSFET)和非对称型3C-SiC DG MOSFET。对两种设计进行了不同长度、不同外加电压下的仿真。从模拟结果可以看出,在22 nm、40 nm和60 nm的通道长度下,非对称3C-SiC DG MOSFET的导通电流值增加,关断电流值减少。
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