Yilei Hua, Changqing Xie, Nan Gao, Xiaoli Zhu, Hailiang Li
{"title":"Fabrication of ultralarge single order diffraction grating with high surface flatness","authors":"Yilei Hua, Changqing Xie, Nan Gao, Xiaoli Zhu, Hailiang Li","doi":"10.1109/DTIP.2017.7984458","DOIUrl":null,"url":null,"abstract":"In this work, we present the fabrication process of a large (100mmx40mm) and thick (30mm) single order diffraction grating with a very flat reflecting surface. This grating is designed for a soft X-ray monochromator. Three single order diffraction gratings with different line densities were integrated on one silicon plate. The gratings are patterned on a 6.35mm thick substrate using direct e-beam writing and etched using high density plasma. Then the grating is glued on to a 23.7mm thick bulk silicon. The flatness of the surface of the gratings was well controlled and tested with an interferometer, the test results show that the peak-to-valley value of the surface is less than 60nm, which meet the requirement for a soft X-ray monochromator.","PeriodicalId":354534,"journal":{"name":"2017 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP)","volume":"244 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DTIP.2017.7984458","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this work, we present the fabrication process of a large (100mmx40mm) and thick (30mm) single order diffraction grating with a very flat reflecting surface. This grating is designed for a soft X-ray monochromator. Three single order diffraction gratings with different line densities were integrated on one silicon plate. The gratings are patterned on a 6.35mm thick substrate using direct e-beam writing and etched using high density plasma. Then the grating is glued on to a 23.7mm thick bulk silicon. The flatness of the surface of the gratings was well controlled and tested with an interferometer, the test results show that the peak-to-valley value of the surface is less than 60nm, which meet the requirement for a soft X-ray monochromator.