F. Gaisenu, C.A. Drimitriadis, J. Stoemenos, C. Postolache, C. Angelis
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引用次数: 0
Abstract
TEM investigations of the LP-LT-CVD thick (1500 nm) polySi layer on 16 nm SiO/sub 2//Si allow one to introduce specific mechanisms to explain the fast polySi regrowth and the SiO/sub 2/ degradation during a short-time (15 min.) moderate (1030/spl deg/C) heat-temperature treatment and during a subsequent 20 min., 1030/spl deg/C annealing.
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