Improving Performance of FBARs by Advanced Low-Temperature High-Pressure Technology

Yu-Fa Tu, T. Chang, Kuan-Ju Zhou, W. Hung, Ting-Tzu Kuo, Chen‐Hsin Lien
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Abstract

In this study, a unique supercritical fluid (SCF) treatment is utilized to improve the resonance properties of thin film bulk acoustic resonators (FBARs) composed of a piezoelectric material of AlN. In an etching process of the sacrificial oxide, FBARs suffered from severe surface tension of etching acid solvent, resulting in structural bonding and residues generation. These impact on FABR’s structural integrity would influence its resonance properties. Therefore, a SCF treatment with low surface tension and high penetrability can effectively carry out residues from the release gap in a FBAR, observed from SEM images. The results show that the reflection coefficient, the quality factor, and the effective coupling coefficient are all improved in FABRs.
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利用先进的低温高压技术提高fbar的性能
在这项研究中,利用一种独特的超临界流体(SCF)处理来改善由AlN压电材料组成的薄膜体声谐振器(fbar)的谐振特性。在牺牲氧化物的蚀刻过程中,fbar受到蚀刻酸溶剂的强烈表面张力,导致结构键合和残基生成。这些对FABR结构完整性的影响将影响其共振特性。因此,从SEM图像中可以观察到,具有低表面张力和高穿透性的SCF处理可以有效地清除FBAR中释放间隙中的残留物。结果表明,fabr的反射系数、质量系数和有效耦合系数均有提高。
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