Influence of dielectric relaxation on thermal electrical characteristics of SrTiO3 thin films with Pt electrodes

Junwoo Son, S. Stemmer
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Abstract

In this presentation we report on the influence of dielectric relaxation on the thermal leakage characteristics of Pt/SrTiO3/Pt thin film structures. We study the influence of temperature and time-dependent leakage currents on recently reported phenomena such as anomalous positive temperature coefficient of resistivity and resistive switching behavior. SrTiO3 was chosen as a model thin film because the dielectric relaxation is not influenced by ferroelectric polarization, as, for example, for (Ba,Sr)TiO3 thin films. We have measured the leakage currents of sputtered, strongly (110) textured SrTiO3 thin films with Pt top and bottom electrodes as a function of time, film thickness, bias field and temperature. We show that apparent dielectric relaxation times decrease with film thickness and increasing temperature and ranged between 1 Ç¿Ï 100 seconds. We show that hysteresis in the I¿V characteristics is strongly correlated with the non-steady state characteristics of the electrical characteristics. The sign of the applied bias field influenced both dielectric relaxation times and hysteresis, reflecting different trap state distributions near bottom and top contacts and/or different barrier heights. Measurements of the leakage currents under applied bias fields as a function of temperature showed distinctive peak was observed around 260K that could be correlated with non-steady state current. We show that for thick films results can be interpreted in terms of trapping/detrapping in the ! depletion region of the blocking contacts. Finally we report on the influence of oxygen vacancies on the hysteresis of the I¿V characteristics and non-steady state current.
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介质弛豫对Pt电极SrTiO3薄膜热电特性的影响
在本报告中,我们报告了介电松弛对Pt/SrTiO3/Pt薄膜结构热泄漏特性的影响。我们研究了温度和时间相关的泄漏电流对最近报道的现象的影响,如电阻率的异常正温度系数和电阻开关行为。选择SrTiO3作为模型薄膜是因为介电弛豫不受铁电极化的影响,例如(Ba,Sr)TiO3薄膜。我们测量了顶部和底部电极为Pt的溅射强(110)织态SrTiO3薄膜的泄漏电流随时间、薄膜厚度、偏置场和温度的变化。我们发现,表观介电弛豫时间随薄膜厚度和温度的增加而减小,范围在1 Ç¿Ï 100秒之间。我们发现,在I¿V特性中的迟滞与电特性的非稳态特性密切相关。施加偏置场的符号影响介质弛豫时间和滞后,反映了底部和顶部接触附近不同的阱态分布和/或不同的势垒高度。在外加偏置场作用下的泄漏电流随温度的变化结果表明,在260K左右可以观察到一个明显的峰值,该峰值可能与非稳态电流相关。我们表明,对于厚膜,结果可以用捕获/脱捕获来解释!阻塞触点的耗尽区。最后,我们报道了氧空位对I¿V特性迟滞和非稳态电流的影响。
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