{"title":"Application of a novel capacitive sensor in precise positioning systems","authors":"Tao Chen, Liguo Chen, M. Pan, Lining Sun","doi":"10.1109/ICIEA.2011.5975867","DOIUrl":null,"url":null,"abstract":"This paper presents a comb-finger capacitive displacement sensor used in nano-positioning system. The displacement sensor is designed to develop an integrated implementation platform and to achieve its closed-loop control. In the design, offset constant-tooth, combinations with S-type beams and flexible cantilevers have been adopted to enhance the position range and structure performance. Surface and bulk micromachining technology is employed to fabricate the sensor from a single crystal silicon wafer. Through testing of the nano-positioning stage, the capability of the sensor has been obtained. The results show that this method can achieve a detect range of 10μm, with resolution of 5nm.","PeriodicalId":304500,"journal":{"name":"2011 6th IEEE Conference on Industrial Electronics and Applications","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th IEEE Conference on Industrial Electronics and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIEA.2011.5975867","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper presents a comb-finger capacitive displacement sensor used in nano-positioning system. The displacement sensor is designed to develop an integrated implementation platform and to achieve its closed-loop control. In the design, offset constant-tooth, combinations with S-type beams and flexible cantilevers have been adopted to enhance the position range and structure performance. Surface and bulk micromachining technology is employed to fabricate the sensor from a single crystal silicon wafer. Through testing of the nano-positioning stage, the capability of the sensor has been obtained. The results show that this method can achieve a detect range of 10μm, with resolution of 5nm.
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